Pressure differential pressure detection alarm system
Machine: Shadows photo resist cover machine
Preface :
PEB / Soft Bake / Hard Bake plays an important role in lithography processes; where PEB (Post Exposure Baking) unit is particularly important for Wafer’s impact, when the Wafer enters the PEB unit for baking, the Exhaust above the unit will continue take the action, take away the Solvent in the process of roasting, if Exhaust excessive changes in the system, will cause a reaction to the product.
Use MSD to monitor Exhaust pumping volume, if found abnormal, you can use MSD instantly intercept or send an alarm.
System frameworks:
